Inicio: go to the homepage U+02B0 para U+02FF Spacing Modifier Letters
Glifo para U+02CC
Fuente: Noto Sans

U+02CC Modifier Letter Low Vertical Line

U+02CC was added in Unicode version 1.1 in 1993. It belongs to the block U+02B0 para U+02FF Spacing Modifier Letters in the U+0000 para U+FFFF Basic Multilingual Plane.

This character is a Modifier Letter and is commonly used, that is, in no specific script.

The glyph is not a composition. It has no designated width in East Asian texts. In bidirectional text it acts as Other Neutral. When changing direction it is not mirrored. U+02CC offers a line break opportunity before its position.

El Wikipedia tiene la siguiente información acerca de este punto de código:

Secondary stress (or obsolete: secondary accent) is the weaker of two degrees of stress in the pronunciation of a word, the stronger degree of stress being called primary. The International Phonetic Alphabet symbol for secondary stress is a short vertical line preceding and at the foot of the secondarily stressed syllable, as before the nun in proˌnunciˈation (the higher vertical line denotes primary stress). Another tradition in English is to assign acute and grave accents for primary and secondary stress, respectively: pronùnciátion.

Most languages have at most one degree of stress on the phonemic level (English can contrast up to four levels of stress, that is, three degrees of stressed and one unstressed, according to some analyses ). That is, each syllable has stress or it does not. Many languages have rhythmic stress; location of the stress may not be predictable, but when the location of one stressed syllable (which may be the primary stress) is known, certain syllables before or after can be predicted to also be stressed; these may have secondary stress. An example is Dutch, where the rule is that initial and final syllables (word boundaries) take secondary stress, then every alternate syllable before and after the primary stress, as long as two stressed syllables are not adjacent and stress does not fall on /ə/ (there are, however, some exceptions to this rule). See Dutch phonology § Stress. A similar rule applies in Romanian: secondary stress falls on every alternate syllable, starting with the first, as long as it does not fall adjacent to the primary stress. In other languages (including Egyptian Radio Arabic, Bhojpuri, Cayuga, Estonian, Hawaiian, Kaure, Malayalam, and Warrgamay), secondary stress can be predicted to fall on heavy syllables.

In other languages, the placement of secondary stress is not predictable, or may not be predictable (and thus be phonemic) for some words. This is frequently posited for Germanic languages, including English. For example, secondary stress is said to arise in compound words like vacuum cleaner, where the first syllable of vacuum has primary stress, while the first syllable of cleaner is usually said to have secondary stress. However, this analysis is problematic; Bolinger (1986) notes that these may be cases of full vs reduced unstressed vowels being interpreted as secondary stress vs unstressed. See Stress and vowel reduction in English for details.

In Norwegian, the pitch accent is lost from one of the roots in a compound word, but the erstwhile tonic syllable retains the full length (long vowel or geminate consonant) of a stressed syllable; this has sometimes been characterized as secondary stress.

Representaciones

Sistema Representación
N.º 716
UTF-8 CB 8C
UTF-16 02 CC
UTF-32 00 00 02 CC
URL-Quoted %CB%8C
HTML hex reference ˌ
Mojibake mal de windows-1252 ◌ˌ
LATEX \Elzverti
AGL: Latin-4 uni02CC
AGL: Latin-5 uni02CC
Adobe Glyph List verticallinelowmod

Otros sitios

Registro completo

Propiedad Valor
Antigüedad (age) 1.1 (1993)
Nombre Unicode (na) MODIFIER LETTER LOW VERTICAL LINE
Nombre Unicode 1 (na1)
Block (blk) Spacing Modifier Letters
Categoría general (gc) Modifier Letter
Script (sc) Common
Categoría de bidireccionalidad (bc) Other Neutral
Combining Class (ccc) Not Reordered
Tipo de descomposición (dt) none
Decomposition Mapping (dm) Glifo para U+02CC Modifier Letter Low Vertical Line
Minúscula (Lower)
Simple Lowercase Mapping (slc) Glifo para U+02CC Modifier Letter Low Vertical Line
Lowercase Mapping (lc) Glifo para U+02CC Modifier Letter Low Vertical Line
Mayúscula (Upper)
Simple Uppercase Mapping (suc) Glifo para U+02CC Modifier Letter Low Vertical Line
Uppercase Mapping (uc) Glifo para U+02CC Modifier Letter Low Vertical Line
Simple Titlecase Mapping (stc) Glifo para U+02CC Modifier Letter Low Vertical Line
Titlecase Mapping (tc) Glifo para U+02CC Modifier Letter Low Vertical Line
Case Folding (cf) Glifo para U+02CC Modifier Letter Low Vertical Line
ASCII Hex Digit (AHex)
Alphabetic (Alpha)
Bidi Control (Bidi_C)
Bidi Mirrored (Bidi_M)
Exclusión de descomposición (CE)
Case Ignorable (CI)
Changes When Casefolded (CWCF)
Changes When Casemapped (CWCM)
Changes When NFKC Casefolded (CWKCF)
Changes When Lowercased (CWL)
Changes When Titlecased (CWT)
Changes When Uppercased (CWU)
Cased (Cased)
Exclusión de composición completa (Comp_Ex)
Default Ignorable Code Point (DI)
Raya (Dash)
Deprecated (Dep)
Diacrítico (Dia)
Base de modificador de emoyi (EBase)
Componente de emoyi (EComp)
Modificador de emoyi (EMod)
Presentación de emoyi (EPres)
Emoyi (Emoji)
Extender (Ext)
Extended Pictographic (ExtPict)
FC NFKC Closure (FC_NFKC) Glifo para U+02CC Modifier Letter Low Vertical Line
Grapheme Cluster Break (GCB) Any
Base de grafema (Gr_Base)
Extensión de grafema (Gr_Ext)
Enlace de grafema (Gr_Link)
Hex Digit (Hex)
Guion (Hyphen)
ID Continue (IDC)
ID Start (IDS)
IDS Binary Operator (IDSB)
IDS Trinary Operator and (IDST)
IDSU (IDSU) 0
ID_Compat_Math_Continue (ID_Compat_Math_Continue) 0
ID_Compat_Math_Start (ID_Compat_Math_Start) 0
Ideographic (Ideo)
InCB (InCB) None
Indic Mantra Category (InMC)
Indic Positional Category (InPC) NA
Indic Syllabic Category (InSC) Other
Jamo Short Name (JSN)
Join Control (Join_C)
Logical Order Exception (LOE)
Math (Math)
Noncharacter Code Point (NChar)
NFC Quick Check (NFC_QC)
NFD Quick Check (NFD_QC)
NFKC Casefold (NFKC_CF) Glifo para U+02CC Modifier Letter Low Vertical Line
NFKC Quick Check (NFKC_QC)
NFKC_SCF (NFKC_SCF) Glifo para U+02CC Modifier Letter Low Vertical Line
NFKD Quick Check (NFKD_QC)
Other Alphabetic (OAlpha)
Other Default Ignorable Code Point (ODI)
Otra extensión de grafema (OGr_Ext)
Other ID Continue (OIDC)
Other ID Start (OIDS)
Other Lowercase (OLower)
Other Math (OMath)
Other Uppercase (OUpper)
Prepended Concatenation Mark (PCM)
Pattern Syntax (Pat_Syn)
Pattern White Space (Pat_WS)
Comilla (QMark)
Indicador regional (RI)
Radical (Radical)
Salto de oración (SB) Other Letter
Soft Dotted (SD)
Sentence Terminal (STerm)
Terminal Punctuation (Term)
Ideograma unificado (UIdeo)
Selector de variación (VS)
Salto de palabra (WB) Letra alfabética
Espacio en blanco (WSpace)
XID Continue (XIDC)
XID Start (XIDS)
Expands On NFC (XO_NFC)
Expands On NFD (XO_NFD)
Expands On NFKC (XO_NFKC)
Expands On NFKD (XO_NFKD)
Bidi Paired Bracket (bpb) Glifo para U+02CC Modifier Letter Low Vertical Line
Bidi Paired Bracket Type (bpt) None
East Asian Width (ea) neutral
Hangul Syllable Type (hst) Not Applicable
ISO 10646 Comment (isc)
Joining Group (jg) No_Joining_Group
Joining Type (jt) Non Joining
Line Break (lb) Salto anterior
Numeric Type (nt) none
Valor numérico (nv) not a number
Simple Case Folding (scf) Glifo para U+02CC Modifier Letter Low Vertical Line
Script Extension (scx)
Orientación vertical (vo) R